Product Short Description:
TETRAMETHYL AMMONIUM HYDROXIDE PENTAHYDRATE FOR SYNTHESIS
Product Description:
It is used as a basic solvent in the development of acidic photoresist in the photolithography process, and is highly effective in stripping photoresist. TMAH has some phase transfer catalyst properties, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanoparticle aggregation.
Safety data sheet: Sigma-Aldrich MSDS for TM...
